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CMOS Cantilever Sensor Systems: Atomic Force Microscopy and by D. Lange,O. Brand,H. Baltes

By D. Lange,O. Brand,H. Baltes

This publication is meant for scientists and engineers within the box of micro- and nano­ electro-mechanical structures (MEMS and NEMS) and introduces the advance of cantilever-based sensor structures utilizing CMOS-compatible micromachining from the layout strategies and simulations to the prototype. it's also an invaluable source for researchers on cantilever sensors and resonant sensors typically The reader turns into conversant in the possibility of the combo of 2 technological ways: IC fabrication know-how, particularly CMOS know-how, and silicon micromachining and the ensuing microstructures resembling cantilever beams. It used to be famous early that those applied sciences will be merged in an effort to make the microstructures clever and devise built-in microsystems with on-chip using and sign conditioning circuitry - referred to now as CMOS MEMS or, with the coming of nanostructures, CMOS NEMS. a technique to accomplish the merger is the post-processing micro- or nano- machining of comprehensive CMOS wafers, a few of that's defined during this publication. The e-book introduces this process in line with paintings conducted on the actual Electronics Laboratory of ETH Zurich on arrays of cantilever transducers with on-chip riding and sign conditioning circuitry. those cantilevers are widely used from Scanning Probe Microscopy (SPM) and make allowance the delicate detection of phys­ ical amounts corresponding to forces and mass alterations. The booklet is split into 3 elements. First, normal elements of cantilever resona­ tors are brought, e. g. their resonant habit and attainable riding and sensing mechanisms.

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